Weed Orthopedic Implants
1 / 4
The Three targets RF magnetron sputtering coater is a cost-effective magnetron sputtering coating equipment. It is standardized, modular and customizable. There are 1-inch or 2-inch magnetron targets for choice. Customers can choose the target according to the size of the substrate to be coated. The device is equipped with three 300W RF power supply, suitable for the preparation of non-metal materials. The three targets can meet the needs of multi-layer or multiple coatings.
Equipped with a two-channel high-precision mass flowmeter, the system can be customized up to four channels. It features advanced turbomolecular pump sets with an ultimate vacuum up to 1.0E-5Pa. The molecular pump gas path is controlled by multiple solenoid valves, allowing users to open the chamber without shutting down the pump, significantly improving efficiency.
| Sample Stage | Size: φ185mm Heating: Max 500ºC |
Control | Accuracy: ±1ºC Rotate: 1-20rpm |
| Target Head | Quantity: 2" × 3 (1", 2" optional) Cooling: Water Cooling |
Chiller | Flow rate: 10L/min |
| Vacuum Chamber | Size: φ300mm × 300mm Material: Stainless steel |
Opening | Top cover open Window: φ100mm |
| Vacuum System | Ultimate Vacuum: 1.0E-5Pa Molecular Pump: 600L/S |
Pumping Speed | 1.0E-3Pa in 20 minutes |
| Power Supply | RF Power: 300W × 3 Total Power: 2.5KW |
Others | Weight: 300kg Voltage: AC220V 50Hz |
This device is ideal for preparing single-layer or multi-layer thin films, including:
